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PRODUCT INFORMATION | TRACE-RITE® RPS |
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TRACE-RITE RPS |
Key Features & Benefits:
Lower Cost of Ownership:
- provides significant gas savings
- optimized cleaning reduces abatement requirements and extends life of active flame units
- reduces chamber erosion from over-cleaning, extending the life of expensive chamber components
- reduces PFC emissions to the environment
Increased Performance:
- increases tool availability for wafer processing by reducing chamber erosion
- lowers particulate generation and improves yields due to reduced over cleaning
- impedance-based approach removes the need to maintain an optical path required by NDIR, FTIR and other optical techniques
TRACE-RITE® RPS has the ability to monitor and control most process tools including those that requires communication that endpoint has been reached, such as the Novellus PECVD/CVD and AKT flat panel tools.
FORTH-RITE®s field-proven TRACE-RITE® software provides superior analysis capabilities and seamless integration with these tools.
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