Forth-Rite Technologies | Trace-Rite Overview

Fewer particles generated by over or under clean conditions
Reduced gas consumption reduces cost
Film and chemistry independent system
Unlike optical, works with optimized, environmentally friendly clean chemistries

TRACE-RITE® is designed to provide real-time RF and impedance measurement-based endpoint signals for either plasma etch or plasma chamber clean processes. TRACE-RITE® family components are readily integrated with all types of plasma-based manufacturing equipment and seamlessly control endpoint detection. This accurate and reliable endpoint detection allows manufacturing cost reduction based on gas flow optimization, minimization of chamber hardware deterioration and clean time reduction.

TRACE-RITE® classic - designed to provide real-time RF and impedance measurement-based endpoint signals for either plasma etch or plasma chamber clean processes.

Three additional variations of TRACE-RITE® have been designed for specific process tool configurations and applications.

TRACE-RITE® analog - also supports analog endpoint signal inputs. In addition, TRACE-RITE® software can be used for data collection, process monitoring and fault detection.

TRACE-RITE® mini - designed to communicate with a plasma process tool through available analog input ports and use the existing process control program to call endpoint.

TRACE-RITE® RPS - designed for chamber clean endpoint detection on PECVD tools a remote plasma source. Real-time impedance measurements from the downstream plasma are monitored for endpoint detection.

Download the Trace-Rite Sales Sheet PDF